Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1991-03-14
1994-01-04
Lee, Benny T.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
315 39, 333 99PL, 333157, 31323131, H05H 146
Patent
active
052763862
ABSTRACT:
In a microwave plasma generating method and apparatus according to the present invention, a slow wave structure is disposed in the propagation region of microwaves, and the microwaves are introduced at a delayed phase velocity into a discharge chamber so that treating gases are transformed into plasma. Thus, the phase velocity of the microwaves is adjusted to a relatively low velocity, at which charged particles are distributed most densely in the plasma, so that the energy may be efficiently transformed to many more charged particles in the plasma. Thus, the plasma of high density is generated to improve a plasma treating rate.
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Fukuyama Ryooji
Kakehi Yutaka
Kanai Saburo
Kawasaki Yoshinao
Nawata Makoto
Hitachi , Ltd.
Lee Benny T.
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