Microwave plasma discharge device

Details Microwave plasma discharge device Microwave plasma discharge device

1996-04-02

1999-10-05

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

156345, 20429838, H05H 100

Patent

active

059618515

ABSTRACT:
A method of removing material from a substrate, and a plasma discharge device wherein a plasma is excited by microwave energy having an electric field which is azimuthally and axially uniform in relation to the plasma tube. The microwave cavity is divided longitudinally into sections by conducting partitions, each of which is separately fed with microwave energy, and the plasma tube extends through openings in the partitions.

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