Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1994-09-28
1997-02-11
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427575, 427571, 427249, 427122, B05D 306, C23C 1600
Patent
active
056018835
ABSTRACT:
A microwave enhanced chemical vapor deposition method is provided for coating plastic articles with crystalline carbon films. First, a reactive gas including hydrogen gas and a carbon containing raw material gas is introduced into a reaction chamber. Next, a magnetic field is established in the reaction chamber. Microwaves are next introduced into the chamber to create a cyclotron resonance in order to form a plasma of carbon and hydrogen containing gas. The carbon containing plasma deposits a coating of a crystalline and amorphous carbon on a substrate placed within the reaction chamber, while the hydrogen plasma simultaneously etches away the amorphous carbon, thereby leaving only crystalline carbon. The method is particularly adapted for the deposition of crystalline carbon films on plastic materials, as the substrate is not required to be heated in order to receive a layer of crystalline carbon.
REFERENCES:
patent: 2721154 (1955-10-01), Hopf et al.
patent: 4060660 (1977-11-01), Carlson et al.
patent: 4104441 (1978-08-01), Fedoseev et al.
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4504519 (1985-03-01), Zelez
patent: 4524106 (1985-06-01), Flasck
patent: 4582727 (1986-04-01), Neelameggham et al.
patent: 4597844 (1986-07-01), Hiraki et al.
patent: 4599135 (1986-07-01), Tsunekawa et al.
patent: 4603082 (1986-07-01), Zelez
patent: 4645713 (1987-02-01), Shioya et al.
patent: 4698256 (1987-10-01), Giglia et al.
patent: 4701317 (1987-10-01), Arakawa et al.
patent: 4707384 (1987-11-01), Schachner et al.
patent: 4715937 (1987-12-01), Moslehi et al.
patent: 4725345 (1988-02-01), Sakamoto et al.
patent: 4728529 (1988-03-01), Etzkorn et al.
patent: 4732761 (1988-03-01), Machida et al.
patent: 4737379 (1988-04-01), Hudgons et al.
patent: 4758280 (1988-07-01), Bergmann et al.
patent: 4770940 (1988-09-01), Ovshinsky et al.
patent: 4772513 (1988-09-01), Sakamoto et al.
patent: 4777090 (1988-10-01), Ovshinsky et al.
patent: 4809876 (1989-03-01), Tomaswick et al.
patent: 5015494 (1991-05-01), Yamazaki
Matsuo, S. and M. Kivchi, "Low Temperature Chemical Vapor Deposition Method Utliizing an Electron Cyclotron Resonance Plasma". Japanese Journal of Applied Physics vol. 22, No. 4, Apr. 1983, pp. 210-212.
Kawarada et al, Jpn. J. Appl. Phys. vol. 26, No. 6, Jun. 1987, pp. L1032-L1034.
Cole Thomas W.
Ferguson Jr. Gerald J.
King Roy V.
Semicondoctor Energy Laboratory Co., Inc.
LandOfFree
Microwave enhanced CVD method for coating plastic with carbon fi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microwave enhanced CVD method for coating plastic with carbon fi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave enhanced CVD method for coating plastic with carbon fi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-340237