Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1994-03-22
1996-04-09
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511121, 31511171, H05H 110
Patent
active
055064752
ABSTRACT:
An electron cyclotron resonance (ECR) ion source includes a primary mirror coil disposed coaxially around a vacuum vessel in which a plasma is induced and introducing a solenoidal ECR-producing field throughout the length of the vacuum vessel. Radial plasma confinement is provided by a multi-cusp, multi-polar permanent magnet array disposed azimuthally around the vessel and within the primary mirror coil. Axial confinement is provided either by multi-cusp permanent magnets at the opposite axial ends of the vessel, or by secondary mirror coils disposed on opposite sides of the primary coil.
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Metal Ion Production In ECRIS (Invited), by R. Geller, P. Ludwig, and G. Melin (Presented on 4 Oct. 1991); Rev. Sci. Instrum. 63 (4) Apr. 1992, 1992 American Institute of Physics.
Microwave Multipolar Plasma for Etching and Deposition, by Rudolf R. Burke and Claude Pomot; Solid State Technology/Feb. 1988.
ECR Sources for the Production of Highly Charged Ions (Invited), by C. M. Lyneis and T. A. Antaya (Presented on 10 Jul. 1989); Rev. Sci. Instrum. 61 (1), Jan. 1990, 1990 American Institute of Physics.
Adams H. W.
Martin Marietta Energy Systems Inc.
Pascal Robert J.
Pennington E. A.
Spicer J. M.
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