Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type
Reexamination Certificate
2007-05-14
2008-10-14
Berman, Jack I. (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Electron probe type
C250S311000, C250S307000, C250S306000, C250S491100, C430S004000, C430S005000, C382S145000
Reexamination Certificate
active
07435959
ABSTRACT:
The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.
REFERENCES:
patent: 4855253 (1989-08-01), Weber
patent: 5412209 (1995-05-01), Otaka et al.
patent: 5412210 (1995-05-01), Todokoro et al.
patent: 5512746 (1996-04-01), Saito
patent: 6128403 (2000-10-01), Ozaki
patent: 6232787 (2001-05-01), Lo et al.
patent: 6343370 (2002-01-01), Taoka et al.
patent: 6363167 (2002-03-01), Miyano et al.
patent: 6426501 (2002-07-01), Nakagawa
patent: 6509750 (2003-01-01), Talbot et al.
patent: 6797975 (2004-09-01), Nishiyama et al.
patent: 08-162383 (1996-06-01), None
patent: A 9-33211 (1997-02-01), None
patent: 10-209230 (1998-08-01), None
patent: A 10-209230 (1998-08-01), None
patent: 11-67853 (1999-03-01), None
patent: 11-251224 (1999-09-01), None
patent: A 11-271233 (1999-10-01), None
patent: 2007-19522 (2007-01-01), None
patent: 2006-189753 (2007-12-01), None
Japanese Office Action dated May 9, 2006 with English translation thereof.
Japanese Office Action dated Jan. 8, 2008 with English translations of Notification of Reasons for Rejection and claims of JPA 2007-19522.
Komuro Osamu
Mizuno Fumio
Sasajima Fumihiro
Berman Jack I.
Hashmi Zia R.
Hitachi , Ltd.
Kenyon & Kenyon LLP
LandOfFree
Microstructured pattern inspection method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microstructured pattern inspection method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microstructured pattern inspection method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4007148