Microlithographic exposure method as well as a projection...

Details Microlithographic exposure method as well as a projection... Microlithographic exposure method as well as a projection...

2004-09-27

2008-08-05

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S069000

Reexamination Certificate

active

07408616

ABSTRACT:
In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

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