Microelectronic processing machine

Details Microelectronic processing machine Microelectronic processing machine

1994-03-10

1996-02-06

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118729, 118666, 118669, 118670, 118684, 118697, 118500, 250306, 2504922, C23C 1600

Patent

active

054893399

ABSTRACT:
An electrode capable of pushing against a silicon substrate with a constant force is mounted inside a vacuum chamber or a gas-replacing chamber. A bias voltage source can supply a given electrical current between the silicon substrate and the electrode. A temperature-controlled heater and a positioning mechanism are mounted under the silicon substrate. A gas inlet nozzle for adjusting the ambient is mounted close to the location of the substrate.

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patent: 5229606 (1993-07-01), Elings
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