Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1995-06-07
1996-12-31
Powell, William
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 11, 216 33, 216 67, 1566501, 1566571, H01L 2100
Patent
active
055890822
ABSTRACT:
A micromechanical filter having planar components, and manufacturable using very large scale integrated circuit microfabrication techniques. The input and output transducers are interdigitated comb electrodes. The mechanical coupling between the input and output transducers includes planar flexures, displacement of the electrodes producing bending of the elements of the flexures. By sealing micromechanical filters in a vacuum and providing on-board circuitry, high signal-to-noise ratios and quality factors are achievable. Construction of a real-time spectrum analyzer using many micromechanical resonators, provides a device with high accuracy and a short sample time.
REFERENCES:
patent: 4918032 (1990-04-01), Jain et al.
patent: 4997521 (1991-03-01), Howe et al.
Howe Roger T.
Lin Liwei
Nguyen Clark T.
Pisano Albert P.
Powell William
The Regents of the University of California
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