Micro-processing apparatus and method therefor

Details Micro-processing apparatus and method therefor Micro-processing apparatus and method therefor

1996-03-26

1998-12-22

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25044211, H01J 3700

Patent

active

058522980

ABSTRACT:
A micro-working apparatus performs fabrication and assembly tasks for micron
anometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.

REFERENCES:
patent: 4663511 (1987-05-01), Tallman
patent: 4843563 (1989-06-01), Takahashi et al.
patent: 4849901 (1989-07-01), Shimizu
patent: 5123174 (1992-06-01), Noguchi
patent: 5142145 (1992-08-01), Yasutake
patent: 5164596 (1992-11-01), Noguchi et al.
patent: 5229607 (1993-07-01), Matsui et al.
Fusao Shimokawa et al., "Reactive-fast-atom beam etching of GaAs using Cl.sub.2 gas", J. Appl. Phys. 66(6), 15 Sep. 1989, published by 1989 American Institute of Physics, 1989, pp. 2613-2618.
Tetsuro Nakamura et al., "Fabrication Technology of Integrated Circuit", published by Sangyo Tosho Publishing Company (Japan), 1987, pp. 21-23 (includes English translation).
Masayuki Nakao et al., "3-dimensional Handling in Nano Manufacturing World", Proceedings of 71st Fall annual meeting of the Japan Society of Mechanical Engineers, published by the Japan Society of Mechanical Engineers, 1993, vol. F, pp. 273-275 (includes English Abstract).
Masayuki Nakao et al., "Realization of 3-D Manufacturing in Nano Manufacturing World", Proceedings of 71st Spring annual meeting of the Japan Society of Mechanical Engineers, published by the Japan Society of Mechanical Engineers, 1993, vol. IV, pp. 485-486 (includes English Abstract).
Patent Abstracts of Japan, vol. 013, No. 220 (E-762), 23 May 1989 & JP 01 033838 A (Nissin Electric Co. Ltd.), 3 Feb. 1989, * Abstract *.
Kenny, M.J. et al.: "A Universal Sample Manipulator with 50 DV Negative Bias" Nuclear Instruments & Method in Physics Research, Section -B: Beam Interactions with Materials and Atoms, vol. B55, No. 1/04, 2 Apr. 1991, pp. 522-526, XP000230730 * p. 523, col. 1, paragraph 2 -col. 2, paragraph 1 *.
"Manipulator for a Vacuum Chamber" NTIS Tech Notes, 1 Mar. 1989, p. 187 XP000117729* the whole document *.
Patent Abstracts of Japan, vol. 007, No. 094 (E-171), 20 Apr. 1983 & JP 58 018850 A (Hitachi Seisakusho KK), 3 Feb. 1983 * Abstract *.

Affiliated with

Also associated with

Rating

Micro-processing apparatus and method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Micro-processing apparatus and method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Micro-processing apparatus and method therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2050292