Methods, systems and structures for forming semiconductor...

Details Methods, systems and structures for forming semiconductor... Methods, systems and structures for forming semiconductor...

2005-01-28

2009-06-30

Lebentritt, Michael S (Department: 2829)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S188000, C257SE21131, C257SE21431, C257SE21634

Reexamination Certificate

active

07553718

ABSTRACT:
A method (100) of forming semiconductor structures (202) including high-temperature processing steps (step118), incorporates the use of a high-temperature nitride-oxide mask (220) over protected regions (214) of the device (202). The invention has application in many different embodiments, including but not limited to, the formation of recess, strained device regions (224).

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