Methods of reducing impurity concentration in isolating...

Details Methods of reducing impurity concentration in isolating... Methods of reducing impurity concentration in isolating...

2011-01-11

2011-01-11

Toledo, Fernando L (Department: 2895)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C257SE21170, C257SE21280, C257SE21584, C257SE23019, C257SE23144, C257S329000, C257S330000, C257S331000, C257S341000, C438S424000, C438S672000, C438S619000, C438S099000, C438S022000

Reexamination Certificate

active

07867924

ABSTRACT:
A method of fabricating a semiconductor device includes forming a lower device on a lower semiconductor substrate, and forming an interlayer insulating film on the lower device. An upper semiconductor substrate is formed on the interlayer insulating film such that the interlayer insulating film is between the lower and upper semiconductor substrates. Upper trenches are formed within the upper semiconductor substrate. An upper device isolating film is formed within the upper trenches. The upper device isolating film is irradiated with ultraviolet light having a wavelength configured to break chemical bonds of impurities in the upper device isolating film to reduce an impurity concentration thereof.

REFERENCES:
patent: 5492851 (1996-02-01), Ryou
patent: 5504022 (1996-04-01), Nakanishi et al.
patent: 5556806 (1996-09-01), Pan et al.
patent: 5663092 (1997-09-01), Lee
patent: 5770482 (1998-06-01), Kadosh et al.
patent: 5888853 (1999-03-01), Gardner et al.
patent: 6075268 (2000-06-01), Gardner et al.
patent: 6165543 (2000-12-01), Otsuki et al.
patent: 6599847 (2003-07-01), Jang et al.
patent: 6624469 (2003-09-01), Harada
patent: 6746918 (2004-06-01), Wu
patent: 6781162 (2004-08-01), Yamazaki et al.
patent: 7056753 (2006-06-01), Lee et al.
patent: 7064405 (2006-06-01), Kondo et al.
patent: 7091088 (2006-08-01), Cheng et al.
patent: 7351656 (2008-04-01), Sakata et al.
patent: 7486368 (2009-02-01), Sakakura et al.
patent: 2001/0048494 (2001-12-01), Koma
patent: 2002/0132464 (2002-09-01), Lee
patent: 2003/0076461 (2003-04-01), Liu et al.
patent: 2003/0148062 (2003-08-01), Solomon et al.
patent: 2003/0227021 (2003-12-01), Yamazaki et al.
patent: 2003/0232472 (2003-12-01), Wu
patent: 2004/0226827 (2004-11-01), Matsuda et al.
patent: 2005/0142806 (2005-06-01), Song
patent: 2005/0264168 (2005-12-01), Lee
patent: 2005/0272220 (2005-12-01), Waldfried et al.
patent: 2006/0094183 (2006-05-01), Wieczorek et al.
patent: 2006/0128250 (2006-06-01), Kim et al.
patent: 2006/0211235 (2006-09-01), Usami
patent: 1019910008980 (1991-10-01), None
patent: 1020050012040 (2005-01-01), None

Affiliated with

Also associated with

Rating

Methods of reducing impurity concentration in isolating... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods of reducing impurity concentration in isolating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of reducing impurity concentration in isolating... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2671689