Methods of forming quantum dots in semiconductor devices

Details Methods of forming quantum dots in semiconductor devices Methods of forming quantum dots in semiconductor devices

2006-01-10

2006-01-10

Dang, Phuc T. (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S509000, C438S962000

Reexamination Certificate

active

06984560

ABSTRACT:
Methods of forming quantum dots in semiconductor devices are disclosed. One example method includes adsorbing metal clusters on a silicon substrate by controlling density thereof, growing silicon by heating the substrate on which the metal clusters are adsorbed, and removing the metal clusters. The example method further includes forming a silicon oxide layer on the substrate and depositing polysilicon on the oxide layer and patterning the polysilicon and the oxide layer.

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