Methods of fabricating borophosphosilicate glass (BPSG) films ha

Details Methods of fabricating borophosphosilicate glass (BPSG) films ha Methods of fabricating borophosphosilicate glass (BPSG) films ha

1997-04-25

1999-07-20

Dutton, Brian

Semiconductor device manufacturing: process

With measuring or testing

Electrical characteristic sensed

438763, 438787, G01R 3126, H01L 2166, H01L 2131, H01L 21469

Patent

active

059266910

ABSTRACT:
Borophosphosilicate glass (BPSG) films having impurity concentrations which remain stable over time are fabricated by removing moisture from a BPSG film and forming a shield film on the BPSG film to reduce reintroduction of moisture into the BPSG film. Moisture is removed from the BPSG film by annealing the BPSG film. The BPSG film may be used to test impurity concentrations in BPSG films of microelectronic devices. The BPSG films may also be used in the manufacture of microelectronic devices.

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patent: 5296745 (1994-03-01), Shirai et al.
patent: 5336640 (1994-08-01), Sato
patent: 5405800 (1995-04-01), Ogawa et al.
patent: 5679475 (1997-10-01), Yamagata et al.
patent: 5786638 (1998-07-01), Yamaha
patent: 5804515 (1998-09-01), Park

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