Methods for treating photoresists

Details Methods for treating photoresists Methods for treating photoresists

1992-09-21

1994-11-22

Dote, Janis

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430313, 430315, 430323, 430324, 430325, 430329, 156628, 156643, G03F 730, G03F 736, G03F 740

Patent

active

053668529

ABSTRACT:
The present invention comprises methods for treating photoresists and forming photoresist relief images, including a method comprising providing a photoresist coating having a crosslinked surface layer, treating the photoresist coating with an organometallic material, and developing the photoresist coating to provide a relief image comprising an etch resistant effective amount of organometallic material.

REFERENCES:
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4396704 (1983-08-01), Taylor
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4430153 (1984-02-01), Gleason et al.
patent: 4433044 (1984-02-01), Meyer et al.
patent: 4552833 (1985-11-01), Ito et al.
patent: 4921778 (1990-05-01), Thackeray et al.
patent: 4931351 (1990-06-01), McColgin et al.
patent: 5079131 (1992-01-01), Thackeray et al.
patent: 5108875 (1992-04-01), Thackeray et al.
patent: 5250375 (1993-10-01), Sebald et al
Patent-Trademark Office English-Language Translation of Japanese Patent 1-94622 (Apr. 13, 1989).

Affiliated with

Also associated with

Rating

Methods for treating photoresists does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods for treating photoresists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for treating photoresists will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1990722