Methods for selective placement of dislocation arrays

Details Methods for selective placement of dislocation arrays Methods for selective placement of dislocation arrays

2007-11-26

2009-02-24

Smith, Bradley K (Department: 2894)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S938000, C438S301000

Reexamination Certificate

active

07494881

ABSTRACT:
Misfit dislocations are selectively placed in layers formed over substrates. Thicknesses of layers may be used to define distances between misfit dislocations and surfaces of layers formed over substrates, as well as placement of misfit dislocations and dislocation arrays with respect to devices subsequently formed on the layers.

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