Methods for preparing photoresist compositions

Details Methods for preparing photoresist compositions Methods for preparing photoresist compositions

1997-10-30

1999-07-06

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, G03F 7004

Patent

active

059195975

ABSTRACT:
Methods are provided to prepare photoresists without isolation of various components, i.e. in a "one-pot" procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.

REFERENCES:
patent: 5216111 (1993-06-01), Zampini
patent: 5290658 (1994-03-01), Uenishi et al.
patent: 5378586 (1995-01-01), Uetani et al.
patent: 5380618 (1995-01-01), Kokubo et al.
patent: 5407778 (1995-04-01), Uetani et al.

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