Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation
Reexamination Certificate
2007-07-27
2010-10-12
Barbee, Manuel L (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Performance or efficiency evaluation
C702S081000, C439S009000
Reexamination Certificate
active
07813895
ABSTRACT:
Methods for matching semiconductor plasma processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in a sample chamber. Measuring the plasma attributes during process perturbations allows for the correlation of process parameters to the plasma optical emission spectra. The process parameters can then be adjusted to yield a processed substrate which matches that of the reference chamber. Methods for monitoring the stability of a plasma processing chamber using a calibrated spectrometer are also disclosed.
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Haney Robert M.
Hunter Aaron
Ranish Joseph
Swenberg Johanes
Tallavarjula Sairaju
Applied Materials Inc.
Barbee Manuel L
Diehl Servilla LLC
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