Methods for making fixed parallel plate MEMS capacitor...

Details Methods for making fixed parallel plate MEMS capacitor... Methods for making fixed parallel plate MEMS capacitor...

2008-07-01

2008-07-01

Nguyen, Cuong Q (Department: 2811)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S253000, C438S393000, C257S532000, C257SE21008

Reexamination Certificate

active

07393740

ABSTRACT:
A fixed parallel plate micro-mechanical systems (MEMS) based sensor is fabricated to allow a dissolved dielectric to flow through a porous top plate, coming to rest on a bottom plate. A post-deposition bake ensures further purity and uniformity of the dielectric layer. In one embodiment the dielectric is a polymer. In one embodiment, a support layer is deposited onto the top plate for strengthening the sensor. In another embodiment, the bottom plate is dual-layered for a narrowed gap. Integrated circuit arrays of such sensors can be made, having multiple devices separated from each other by a physical barrier, such as a polycrystalline containment rim or trough, for preventing polymer material from one sensor from interfering with that of another.

REFERENCES:
patent: 6724612 (2004-04-01), Davis et al.
patent: 6808983 (2004-10-01), Hill
patent: 6812821 (2004-11-01), Fujita et al.
patent: 6912116 (2005-06-01), Takahashi et al.
patent: 7049679 (2006-05-01), Nagai et al.

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