Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate
2006-09-26
2006-09-26
Deo, Duy-Vu N. (Department: 1765)
Etching a substrate: processes
Gas phase etching of substrate
With measuring, testing, or inspecting
C216S060000, C216S062000, C216S072000, C438S712000
Reexamination Certificate
active
07112288
ABSTRACT:
Methods are provided for delineating different layers and interfaces for inspection of a semiconductor wafer, wherein a sectioned portion of a wafer is subjected to a reactive ion etch process before inspection using a scanning electron microscope.
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Clark Fred Y.
Farber David G.
Vance Andrew L.
Brady III W. James
Deo Duy-Vu N.
Garner Jacqueline J.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
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