Methods for exhausting a wafer coating apparatus

Details Methods for exhausting a wafer coating apparatus Methods for exhausting a wafer coating apparatus

1998-06-22

2000-10-17

Bell, Janyce

Coating processes

Centrifugal force utilized

4273855, 427336, 437231, B05D 312

Patent

active

061328022

ABSTRACT:
Methods for exhausting coating materials used in the process of spin coating a top surface of a wafer, the wafer having an edge and a bottom surface that is supported and rotated by a rotatable chuck attached by a shaft to a spin motor. The apparatus includes a bowl having an exhausted drain configured to receive excess liquid and vapor from the spin coating and an assembly configured to maintain the drain at a negative pressure differential relative to the bowl. In a preferred embodiment, a baffle is attached to the bottom to limit the flow of the liquid and vapor into the drain to a predetermined direction.

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