Methods for cleaning a substrate

Details Methods for cleaning a substrate Methods for cleaning a substrate

2007-10-30

2007-10-30

Warden, Jill (Department: 1746)

Cleaning and liquid contact with solids

Processes

With treating fluid motion

C134S030000, C134S031000, C134S037000

Reexamination Certificate

active

11330004

ABSTRACT:
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparatus for executing a washing process, a cleaning process and a working process of a subject, is provided with a water vapor body supplying means for supplying a water vapor body, and a water mist body supplying means for supplying a water mist body containing liquid water fine particles, and the structure is made such that said water vapor body and said water mist body are supplied to the subject by independently controlling said two means.

REFERENCES:
patent: 5887605 (1999-03-01), Lee et al.
patent: 6589359 (2003-07-01), Kamikawa et al.
patent: 6610168 (2003-08-01), Miki et al.

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