Methods and apparatuses for trench depth detection and control

Details Methods and apparatuses for trench depth detection and control Methods and apparatuses for trench depth detection and control

2005-04-12

2005-04-12

Deo, Duy-Vu N. (Department: 1765)

Etching a substrate: processes

Nongaseous phase etching of substrate

C216S088000, C356S484000, C356S496000, C356S504000, C356S626000

Reexamination Certificate

active

06878301

ABSTRACT:
A method for optically detecting a trench depth includes detecting a first maxima in an intensity of multi-wavelength light. A portion of the multi-wavelength light is reflected from a top trench surface. A second maxima in an intensity of multi-wavelength light is also detected. A portion of the multi-wavelength light is reflected from a bottom trench surface. A maxima peak separation between the first maxima and the second maxima is determined. The trench depth corresponds to the maxima peak separation.

REFERENCES:
patent: 4615620 (1986-10-01), Noguchi et al.
patent: 4927485 (1990-05-01), Cheng et al.
patent: 4988198 (1991-01-01), Kondo
patent: 5023188 (1991-06-01), Tanaka
patent: 5087121 (1992-02-01), Kakuchi et al.
patent: 5384639 (1995-01-01), Wickramasinghe
patent: 6275297 (2001-08-01), Zalicki
patent: 6650426 (2003-11-01), Zalicki

Affiliated with

Also associated with

Rating

Methods and apparatuses for trench depth detection and control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods and apparatuses for trench depth detection and control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods and apparatuses for trench depth detection and control will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3366723