Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2004-08-20
2009-02-17
Nguyen, Nam X (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192260, C204S298060, C204S298240, C204S298250, C204S298260
Reexamination Certificate
active
07491301
ABSTRACT:
A method and apparatus for coating two sides of a single pane of glass or other substrate in a single pass through a coating apparatus. A sputtering line is provided, this line comprising a series of sputtering chambers. At least one of the chambers comprises a downward sputtering chamber having an upper target. At least one of the chambers comprises an upward sputtering chamber having a lower target. In some embodiments, the upper and lower targets are rotary targets. The coating apparatus advantageously has a plurality of transport rollers for conveying the substrate along the sputtering line. In certain embodiments, a majority of the chambers of the sputtering line are downward sputtering chambers each having only an upper target with no lower target.
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Bond Bob
Hartig Klaus
Krisko Annette J.
Pfaff Gary
Stanek Roger
Brayton John
Cardinal CG Company
Fredrikson & Byron , P.A.
Nguyen Nam X
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