Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2007-03-13
2007-03-13
Philogene, Haissa (Department: 2828)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111510, C315S224000, C315S291000, C156S345480, C156S345440, C118S7230IR, C118S7230AN
Reexamination Certificate
active
10703843
ABSTRACT:
An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second terminal, the first terminal being coupled with a first electrical measuring device, the second terminal being coupled with a second electrical measuring device. The arrangement also includes coupling a compensating circuit to the second terminal. The arrangement further includes providing a feedback circuit coupled to receive information from the first electrical measuring device and the second electrical measuring device, an output of the feedback circuit being employed to control the compensating circuit in order to keep a ratio between a first electrical value at the first terminal and a second electrical value at the second terminal substantially at a predefined value.
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Patrick Roger
Richardson Brett
Williams Norman
IP Strategy Group PC
Lam Research Corporation
Philogene Haissa
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