Brushing – scrubbing – and general cleaning – Machines – Brushing
Reexamination Certificate
2006-01-17
2006-01-17
Chin, Randall (Department: 1744)
Brushing, scrubbing, and general cleaning
Machines
Brushing
C015S088300, C015S088400, C015S102000
Reexamination Certificate
active
06986185
ABSTRACT:
In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the monitored torque to regulate the pressure applied to the wafer by the brush. Open loop positioning or closed loop control may be employed.
REFERENCES:
patent: 4382308 (1983-05-01), Curcio
patent: 6269510 (2001-08-01), Beardsley et al.
patent: 6739013 (2004-05-01), Glashauser et al.
Galburt Vladimir
Sugarman Michael N.
Applied Materials Inc.
Chin Randall
Dugan & Dugan
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