Method to make nano structure below 25 nanometer with high...

Details Method to make nano structure below 25 nanometer with high... Method to make nano structure below 25 nanometer with high...

2008-01-29

2008-01-29

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C977S789000

Reexamination Certificate

active

10987743

ABSTRACT:
A method of making a nano structure smaller than 25 nanometers utilizing atomic layer deposition, planarizing, and etching techniques.

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