Method to make a wider trailing pole structure by...

Details Method to make a wider trailing pole structure by... Method to make a wider trailing pole structure by...

2005-11-01

2005-11-01

VerSteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C427S130000, C427S131000, C427S132000

Reexamination Certificate

active

06960281

ABSTRACT:
A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a tapered profile that is widest at its trailing edge. Such a pole piece is capable of writing narrow tracks with sharply and well defined patterns and minimal overwriting of adjacent tracks. The present method produces the necessary taper by using NiCr, NiFeCr, Rh or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant. As a result, the write gap does not protrude to mask the effects of the ion-beam etch used to form the taper.

REFERENCES:
patent: 5578342 (1996-11-01), Tran et al.
patent: 5843521 (1998-12-01), Ju et al.
patent: 5901432 (1999-05-01), Armstrong et al.
patent: 6199267 (2001-03-01), Koshikawa et al.
patent: 6243939 (2001-06-01), Chen et al.
patent: 6385008 (2002-05-01), Santini et al.
“A Self-Aligned Pole Trim Process,” filed Oct. 31, 2002, U.S. Appl. No. 10/284,848, assigned to the same assignee.

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