Method to improve electrical leakage performance and to...

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation

Reexamination Certificate

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C427S529000, C427S527000, C427S530000, C250S492210, C438S474000, C438S766000, C438S798000

Reexamination Certificate

active

07981483

ABSTRACT:
Embodiments of methods for improving electrical leakage performance and minimizing electromigration in semiconductor devices are generally described herein. Other embodiments may be described and claimed.

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