Method to form a film

Details Method to form a film Method to form a film

2004-06-22

2009-08-18

Lee, Hsien-ming (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S378000, C257SE21400, C257SE21297, C427S343000, C427S567000

Reexamination Certificate

active

07575979

ABSTRACT:
A method includes forming a fluid including an inorganic semiconductor material, depositing a layer of said fluid on a substrate to form a film, and curing said film to form a porous semiconductor film.

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