Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2004-09-02
2010-02-02
Chea, Thorl (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S311000, C430S313000, C430S316000
Reexamination Certificate
active
07655387
ABSTRACT:
Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the integrated circuit, are increased. The narrow mask lines are formed by pitch multiplication and the wider mask lines are formed by photolithography. The wider mask lines and are aligned so that one side of those lines is flush with or inset from a corresponding side of the narrow lines. Being wider, the opposite sides of the wider mask lines protrude beyond the corresponding opposite sides of the narrow mask lines. The wider mask lines are formed in negative photoresist having a height less than the height of the narrow mask lines. Advantageously, the narrow mask lines can prevent expansion of the mask lines in one direction, thus increasing alignment tolerances in that direction. In the other direction, use of photolithography and a shadowing effect caused by the relative heights of the photoresist and the narrow mask lines causes the wider mask lines to be formed with a rounded corner, thus increasing alignment tolerances in that direction by increasing the distance to a neighboring narrow mask line.
REFERENCES:
patent: 4234362 (1980-11-01), Riseman
patent: 4419809 (1983-12-01), Riseman et al.
patent: 4432132 (1984-02-01), Kinsbron et al.
patent: 4502914 (1985-03-01), Trumpp et al.
patent: 4508579 (1985-04-01), Goth et al.
patent: 4570325 (1986-02-01), Higuchi
patent: 4648937 (1987-03-01), Ogura et al.
patent: 4716131 (1987-12-01), Okazawa et al.
patent: 4776922 (1988-10-01), Bhattacharyya et al.
patent: 4838991 (1989-06-01), Cote et al.
patent: 5013680 (1991-05-01), Lowrey et al.
patent: 5047117 (1991-09-01), Roberts
patent: 5053105 (1991-10-01), Fox, III
patent: 5117027 (1992-05-01), Bernhardt et al.
patent: 5328810 (1994-07-01), Lowrey et al.
patent: 5330879 (1994-07-01), Dennison
patent: 5470661 (1995-11-01), Bailey et al.
patent: 5514885 (1996-05-01), Myrick
patent: 5670794 (1997-09-01), Manning
patent: 5753546 (1998-05-01), Koh et al.
patent: 5789320 (1998-08-01), Andricacos et al.
patent: 5795830 (1998-08-01), Cronin et al.
patent: 5830332 (1998-11-01), Babich et al.
patent: 5899746 (1999-05-01), Mukai
patent: 5998256 (1999-12-01), Juengling
patent: 6004862 (1999-12-01), Kim et al.
patent: 6010946 (2000-01-01), Hisamune et al.
patent: 6042998 (2000-03-01), Brueck et al.
patent: 6057573 (2000-05-01), Kirsch et al.
patent: 6063688 (2000-05-01), Doyle et al.
patent: 6071789 (2000-06-01), Yang et al.
patent: 6110837 (2000-08-01), Linliu et al.
patent: 6143476 (2000-11-01), Ye et al.
patent: 6211044 (2001-04-01), Xiang et al.
patent: 6288454 (2001-09-01), Allman et al.
patent: 6291334 (2001-09-01), Somekh
patent: 6297554 (2001-10-01), Lin
patent: 6335257 (2002-01-01), Tseng
patent: 6348380 (2002-02-01), Weimer et al.
patent: 6362057 (2002-03-01), Taylor, Jr. et al.
patent: 6383907 (2002-05-01), Hasegawa et al.
patent: 6395613 (2002-05-01), Juengling
patent: 6423474 (2002-07-01), Holscher
patent: 6455372 (2002-09-01), Weimer
patent: 6475867 (2002-11-01), Hui et al.
patent: 6514884 (2003-02-01), Maeda
patent: 6522584 (2003-02-01), Chen et al.
patent: 6534243 (2003-03-01), Templeton
patent: 6548396 (2003-04-01), Naik et al.
patent: 6559017 (2003-05-01), Brown et al.
patent: 6566280 (2003-05-01), Meagley et al.
patent: 6573030 (2003-06-01), Fairbairn et al.
patent: 6602779 (2003-08-01), Li et al.
patent: 6632741 (2003-10-01), Clevenger et al.
patent: 6667237 (2003-12-01), Metzler
patent: 6673684 (2004-01-01), Huang et al.
patent: 6686245 (2004-02-01), Mathew et al.
patent: 6689695 (2004-02-01), Lui et al.
patent: 6706571 (2004-03-01), Yu et al.
patent: 6709807 (2004-03-01), Hallock et al.
patent: 6734107 (2004-05-01), Lai et al.
patent: 6744094 (2004-06-01), Forbes
patent: 6773998 (2004-08-01), Fisher et al.
patent: 6794699 (2004-09-01), Bissey et al.
patent: 6800930 (2004-10-01), Jackson et al.
patent: 6835662 (2004-12-01), Erhardt et al.
patent: 6867116 (2005-03-01), Chung
patent: 6875703 (2005-04-01), Furukawa et al.
patent: 6893972 (2005-05-01), Rottstegge et al.
patent: 6924191 (2005-08-01), Liu et al.
patent: 6962867 (2005-11-01), Jackson et al.
patent: 7015124 (2006-03-01), Fisher et al.
patent: 7074668 (2006-07-01), Park et al.
patent: 7183205 (2007-02-01), Hong
patent: 7183597 (2007-02-01), Doyle
patent: 7208379 (2007-04-01), Venugopal et al.
patent: 7288445 (2007-10-01), Bryant et al.
patent: 7291560 (2007-11-01), Parascandola et al.
patent: 2001/0005631 (2001-06-01), Kim et al.
patent: 2002/0004298 (2002-01-01), Bjamason et al.
patent: 2002/0045308 (2002-04-01), Juengling
patent: 2002/0063110 (2002-05-01), Cantell et al.
patent: 2002/0068243 (2002-06-01), Hwang et al.
patent: 2002/0127810 (2002-09-01), Nakamura et al.
patent: 2003/0006410 (2003-01-01), Doyle
patent: 2003/0044722 (2003-03-01), Hsu et al.
patent: 2003/0109102 (2003-06-01), Kujirai et al.
patent: 2003/0119307 (2003-06-01), Bekiaris et al.
patent: 2003/0127426 (2003-07-01), Chang et al.
patent: 2003/0157436 (2003-08-01), Manger et al.
patent: 2003/0207207 (2003-11-01), Li
patent: 2003/0207584 (2003-11-01), Sivakumar et al.
patent: 2003/0216050 (2003-11-01), Golz et al.
patent: 2003/0230234 (2003-12-01), Nam et al.
patent: 2004/0000534 (2004-01-01), Lipinski
patent: 2004/0017989 (2004-01-01), So
patent: 2004/0018738 (2004-01-01), Liu
patent: 2004/0023475 (2004-02-01), Bonser et al.
patent: 2004/0041189 (2004-03-01), Voshell et al.
patent: 2004/0043623 (2004-03-01), Liu et al.
patent: 2004/0053475 (2004-03-01), Sharma
patent: 2004/0079988 (2004-04-01), Harari
patent: 2004/0023502 (2004-05-01), Tzou et al.
patent: 2004/0106257 (2004-06-01), Okamura et al.
patent: 2004/0235255 (2004-11-01), Tanaka et al.
patent: 2005/0074949 (2005-04-01), Jung et al.
patent: 2005/0112886 (2005-05-01), Asakawa et al.
patent: 2005/0142497 (2005-06-01), Ryou
patent: 2005/0153562 (2005-07-01), Furukawa et al.
patent: 2005/0164454 (2005-07-01), Leslie
patent: 2005/0167394 (2005-08-01), Liu et al.
patent: 2005/0186705 (2005-08-01), Jackson et al.
patent: 2005/0272259 (2005-12-01), Hong
patent: 2006/0003182 (2006-01-01), Lane et al.
patent: 2006/0024940 (2006-02-01), Furukawa et al.
patent: 2006/0024945 (2006-02-01), Kim et al.
patent: 2006/0046161 (2006-03-01), Yin et al.
patent: 2006/0046200 (2006-03-01), Abatchev et al.
patent: 2006/0046201 (2006-03-01), Sandhu et al.
patent: 2006/0046422 (2006-03-01), Tran et al.
patent: 2006/0046484 (2006-03-01), Abatchev et al.
patent: 2006/0083996 (2006-04-01), Kim
patent: 2006/0172540 (2006-08-01), Marks et al.
patent: 2006/0189150 (2006-08-01), Jung
patent: 2006/0211260 (2006-09-01), Tran et al.
patent: 2006/0216923 (2006-09-01), Tran et al.
patent: 2006/0231900 (2006-10-01), Lee et al.
patent: 2006/0263699 (2006-11-01), Abatchev et al.
patent: 2006/0267075 (2006-11-01), Sandhu et al.
patent: 2006/0273456 (2006-12-01), Sant et al.
patent: 2006/0281266 (2006-12-01), Wells
patent: 2007/0026672 (2007-02-01), Tang et al.
patent: 2007/0045712 (2007-03-01), Haller et al.
patent: 2007/0048674 (2007-03-01), Wells
patent: 2007/0049011 (2007-03-01), Tran
patent: 2007/0049030 (2007-03-01), Sandhu et al.
patent: 2007/0049032 (2007-03-01), Abatchev et al.
patent: 2007/0049035 (2007-03-01), Tran
patent: 2007/0049040 (2007-03-01), Bai et al.
patent: 2007/0050748 (2007-03-01), Juengling
patent: 2007/0210449 (2007-09-01), Caspary et al.
patent: 2007/0215960 (2007-09-01), Zhu et al.
patent: 2007/0275309 (2007-11-01), Liu
patent: 2008/0054350 (2008-03-01), Breitwisch et al.
patent: 280851 (1990-07-01), None
patent: 0227303 (1987-07-01), None
patent: 0491408 (1992-06-01), None
patent: 1357433 (2003-10-01), None
patent: 05343370 (1993-12-01), None
patent: H8-55908 (1996-02-01), None
patent: H8-55920 (1996-02-01), None
patent: 1999-0001440 (1999-01-01), None
patent: 1999-027887 (1999-04-01), None
patent: WO 02/099864 (2002-12-01), None
patent: WO 2004/001799 (2003-12-01), None
patent: WO 2004/003977 (2004-01-01), None
patent: WO 2005/010973 (2005-02-01), None
patent: WO 2005/034215 (2005-04-01), None
patent: WO 2006-0266
Chance Randal W.
Rericha William T.
Sandhu Gurtej S.
Chea Thorl
Knobbe Martens Olson & Bear LLP
Micro)n Technology, Inc.
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