Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-02-23
2009-12-29
Seth, Manav (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S181000, C716S030000, C430S004000, C430S014000
Reexamination Certificate
active
07639864
ABSTRACT:
Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.
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Chen Jang Fung
Socha Robert J.
ASML Masktools B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Seth Manav
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