4. Sewing
  5. Elements
  6. Presser devices

Robert J. Socha

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Eigen decomposition based OPC model

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Eigen decomposition based OPC model

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method, program product and apparatus for optimizing...

Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate

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Method, program product and apparatus for performing...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Needle shift warning arrangement in an electronically controlled

Sewing – Work manipulating – Guides
Patent

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Profile ID: LFUS-PAI-P-339048

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