Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1990-04-19
1995-02-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430270, 430330, 430920, 430922, 430925, 430926, G03F 730, G03F 740
Patent
active
053914651
ABSTRACT:
A method is provided for using selected photoactive compounds in acid hardening photoresists to produce thermally stable, high resolution images with near ultraviolet exposing radiation. These photoactive compounds can be used as photosensitizers for halogen-containing photoacid generators which by themselves do not otherwise generate sufficient acid upon exposure to near ultraviolet radiation to catalyze the crosslinking of acid hardening resins. The photoactive compounds are selected from the group consisting of phenothiazine, derivatives of phenothiazine, and phenoxazine.
REFERENCES:
patent: 4343885 (1982-08-01), Reardon et al.
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4548890 (1985-10-01), Dickinson et al.
patent: 4632891 (1986-12-01), Banks et al.
patent: 4659649 (1987-04-01), Dickinson et al.
patent: 4816379 (1989-03-01), Bronstert et al.
patent: 4983498 (1991-01-01), Rode et al.
patent: 5034304 (1991-07-01), Feely
Journal of Imaging Technology, vol. 11, No. 4, Aug. 1985, pp. 146-157, Springfield, Va.
Bowers Jr. Charles L.
Chu John S.
Rohm and Haas Company
Strobaugh Terence P.
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