Method of using a positive electron beam resist medium

Details Method of using a positive electron beam resist medium Method of using a positive electron beam resist medium

1981-12-14

1983-08-09

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430313, 430327, 430276, 20415914, 2041592, 528364, G03C 500

Patent

active

043979394

ABSTRACT:
This invention relates to novel terpolymers of vinyl acetate, 3-methylcyclopentene and sulfur dioxide. Positive electron beam resist media prepared from the subject terpolymers possesses excellent sensitivity and development latitude.

REFERENCES:
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 3898350 (1975-08-01), Gipstein et al.
patent: 3931435 (1976-01-01), Gipstein et al.
patent: 3935331 (1976-01-01), Poliniak et al.
patent: 3935332 (1976-01-01), Poliniak et al.
patent: 4153741 (1979-05-01), Poliniak et al.
patent: 4215035 (1980-07-01), Memering et al.
patent: 4341861 (1982-07-01), Pampalone
Chemical Abstract 85: 78465e, "Mechanism of Alternating Copolymerization of Sulfur Dioxide With Donor Monomers", Stoyachenko, I. L.
J. of Polymer Sci., Polymer Physics Edition, vol. 11, 1713-1721, (1973).

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