Method of treating a workpiece with a plasma and processing reac

Details Method of treating a workpiece with a plasma and processing reac Method of treating a workpiece with a plasma and processing reac

1993-10-25

1995-09-12

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 2041921, 20429806, 20429834, 118723E, 118723I, 118723MP, H05H 100

Patent

active

054494320

ABSTRACT:
A plasma generator for the fabrication of integrated circuit devices is described. The generator includes a separate plasma igniter electrode to apply the electrical power to a gas within a treatment chamber necessary to create a desired plasma. The plasma, once it is initiated, then is sustained by inductive coupling.

REFERENCES:
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4844775 (1989-07-01), Keeble
Bhattacharya, "System for Varying the Directionality in Plasma Etching", IBM Technical Disclosure Bulletin, vol. 20, No. 3, Aug. 1977.

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