Method of substrate heating for deposition processes

Details Method of substrate heating for deposition processes Method of substrate heating for deposition processes

1982-10-18

1985-04-30

Bernstein, Hiram H.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156613, 156DIG103, 118725, 427 55, 427 86, B05D 306, H01L 2120, C23C 1300

Patent

active

045142505

ABSTRACT:
Strain-free mounting and uniform heating of deposition substrates are achieved by coating the backside of the substrate such as a GaAs substrate with a reflective layer. A reflective environment formed, for example, by tantalum foils allows reflections between the reflective surface of the substrate and the reflective surface of the environment. These multiple reflections, in turn, produce uniform heating of the substrate.

REFERENCES:
patent: 3627590 (1971-12-01), Mammel
patent: 3634150 (1972-01-01), Horn
patent: 4081313 (1978-03-01), McNeilly et al.

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