Method of reducing sensitivity of EUV photoresists to...

Details Method of reducing sensitivity of EUV photoresists to... Method of reducing sensitivity of EUV photoresists to...

2005-03-29

2008-12-02

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

07459260

ABSTRACT:
A modified EUV photoresist and a method of making the resist. The modified resist includes an EUV photoresist and a LAM incorporated into the EUV photoresist.

REFERENCES:
patent: 6656660 (2003-12-01), Urano et al.
patent: 2002/0021425 (2002-02-01), Janssen et al.
patent: 2005/0053861 (2005-03-01), Yoneda et al.
William Reusch, Visible and Ultraviolet Spectroscopy, May 10, 2004 http://www.cem.msu.edu/˜reusch/VirtualText/Spectrpy/UV-Vis/spectrum.htm.

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