Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2007-11-09
2010-06-15
Luu, Chuong A. (Department: 2892)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S029000, C438S072000, C438S069000
Reexamination Certificate
active
07737040
ABSTRACT:
An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
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Almogy Gilad
Bencher Christopher Dennis
Buxbaum Alexander
Ding Jian
Lee Yung-Hee Yvette
Applied Materials Inc.
Church, Esq. Shirley L.
Luu Chuong A.
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