Method of producing high T.sub.c superconducting NbN films

Details Method of producing high T.sub.c superconducting NbN films Method of producing high T.sub.c superconducting NbN films

1985-08-12

1988-02-23

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, C23C 1434

Patent

active

047268905

ABSTRACT:
Thin films of niobium nitride with high superconducting temperature (T.sub.c) of 15.7.degree. K. are deposited on substrates held at room temperature (.about.90.degree. C.) by heat sink throughout the sputtering process. Films deposited at P.sub.Ar >12.9.+-.0.2 mTorr exhibit higher T.sub.c with increasing P.sub.N2,I, with the highest T.sub.c achieved at P.sub.N2,I =3.7.+-.0.2 mTorr and total sputtering pressure P.sub.tot =16.6.+-.0.4. Further increase of N.sub.2 injection starts decreasing T.sub.c.

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