Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1994-07-20
1996-12-17
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430316, 430318, 430324, 216 47, 216 48, 216 33, G03C 500
Patent
active
055852246
ABSTRACT:
A method of producing an aperture grill of a CRT display device is disclosed. The aperture grill is of a small thickness of the order of 20 to 100 .mu.m. To a metal plate with front and rear surface resin layers are applied front slit pattern mask with a single broad slit pattern and a rear slit pattern mask with two adjacent, narrow slit patterns. With these two masks disposed in opposition, the slit patterns are printed and developed on the resist layers. Thereafter, etching is carried out on the rear surface of the metal plate via the rear resist layer, and rear cavities are formed in the metal plate. Then, a reinforcing, etchant-proof film is attached to the rear resist layer to cover the rear cavities, and thereafter etching is carried out on the front surface of the metal plate via the front resist layer, to thereby form a front cavity. As the front etching proceeds, the front cavity is caused to communicate with the rear cavities with the etchant flowing into the rear cavities, and the front and rear cavities are made into a single through slit. Thereafter the reinforcing film is removed. The method makes it possible to easily produce slits of dimensional accuracy.
REFERENCES:
patent: 4662984 (1987-05-01), Ohtake et al.
patent: 4689114 (1987-08-01), Ohtake et al.
patent: 5200025 (1993-04-01), Toei et al.
patent: 5348825 (1994-09-01), Nakamura et al.
Ikegami Takeshi
Ishii Yasuhiko
Makita Akira
Nakamura Osamu
Dai Nippon Printing Co. Ltd.
Lesmes George F.
Weiner Laura
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