Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1990-04-24
1991-05-28
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430328, 430330, G03C 516, G03F 740, G03F 7022, G03F 7039
Patent
active
050194887
ABSTRACT:
A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.
REFERENCES:
patent: 4496647 (1985-01-01), Kawabe et al.
patent: 4546066 (1985-10-01), Fields et al.
patent: 4576901 (1986-03-01), Stahlhofen et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4663268 (1987-05-01), Turner et al.
patent: 4696891 (1987-09-01), Guzzi
patent: 4736055 (1988-04-01), Dietliker et al.
patent: 4775609 (1988-10-01), McFarland
patent: 4810613 (1989-03-01), Osuch et al.
Durham Dana
Jain Sangya
Mammato Donald C.
McFarland Michael
Spak Mark A.
Bowers Jr. Charles L.
Buscher Mark R.
Hoechst Celanese Corporation
Roberts Richard S.
LandOfFree
Method of producing an image reversal negative photoresist havin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing an image reversal negative photoresist havin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing an image reversal negative photoresist havin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-35616