Method of producing a resist pattern by contact imaging a photoi

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4302811, 4302881, G03C 500

Patent

active

056983760

ABSTRACT:
In a method of providing a resist pattern on a substrate surface, a layer of photoimageable composition is applied to a substrate, which photoimageable composition provides a tack-free surface. The photoimageable composition comprises:
A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system (the weight percentages are based on the total weight of components A)-C)). The binder polymer A) comprises a backbone formed of between about 45 and about 65 mole percent of monomers which are selected from the group i) consisting of styrene, C.sub.1 14 C.sub.6 -substituted styrene and mixtures thereof and between about 35 and about 55 mole percent of monomers which are selected from the group ii) consisting of maleic anhydride, alkyl-substituted maleic anhydride, aromatic-substituted maleic anhydride and mixtures thereof. Monomers of group ii) provide anhydride groups to the backbone of the polymer. The anhydride groups are mono-esterified to between about 50 and about 65 mole percent with an alkyl, aryl, cycloalkyl, alkylaryl, or arylalkyl first alcohol a) having a molecular weight of at least 100 or mixture of first alcohols a); and the anhydride groups are mono-esterified to between about 15 and about 50 mole percent of a C.sub.1 -C.sub.3 -alkyl second alcohol b) or mixture of second alcohols b). Polymer A) is mono-esterified to at least about 80 mole percent total of its anhydride groups. The polymer has a weight average molecular weight of between about 80,000 and about 200,000, and an acid number of between about 170 and about 220.
The photoimageable composition layer is directly contacted with patterned artwork, exposed through the artwork, and developed in alkaline aqueous solution to remove non-exposed portions thereof.

REFERENCES:
patent: 5296334 (1994-03-01), Castaldi et al.
patent: 5576145 (1996-11-01), Keil et al.
patent: 5609991 (1997-03-01), Briguglio et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing a resist pattern by contact imaging a photoi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing a resist pattern by contact imaging a photoi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a resist pattern by contact imaging a photoi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-204370

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.