Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2006-06-20
2006-06-20
Barreca, Nicole (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S394000, C516S098000
Reexamination Certificate
active
07063938
ABSTRACT:
A method of preparing patterned colloidal crystals includes filling a monomer solution in the interstices between particles of planar colloidal crystals for photopolymerization inside them, and performing a selective photopolymerization process between the colloidal crystals using a mask. In one exemplary method, a first monomer solution for photopolymerization is filled inside planar colloidal crystals. A first selective photopolymerization process is performed inside the colloidal crystals using a mask. A second monomer solution for photopolymerization is filled into the firstly patterned colloidal crystals. At least one additional photopolymerization process is performed inside the firstly patterned colloidal crystals using an additional mask. Through this method, colloidal crystalline regions oriented in the same direction with different refractive indexes can be controlled in a level of μm. Further, repeated patterns can be inexpensively and easily prepared.
REFERENCES:
patent: 4522910 (1985-06-01), Hallman
patent: 5332651 (1994-07-01), Dickinson et al.
patent: 2002/0143073 (2002-10-01), Jiang et al.
Kim Sarah
Park Yong-Hak
Yang Seung-Man
Yi Ki-Ra
Barreca Nicole
Korea Advanced Institute of Science and Technology
Martine & Penilla & Gencarella LLP
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