Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1984-08-09
1986-06-03
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156652, 156656, 1566591, 156667, 204192E, 360110, B44C 122, C03C 1500, C03C 2506, C23F 102
Patent
active
045928010
ABSTRACT:
A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying out the ion beam etching which uses a carbon fluoride gas, while using a photoresist film as a mask.
REFERENCES:
patent: 4288283 (1981-09-01), Umezaki et al.
patent: 4390394 (1983-06-01), Mathuni et al.
J. Appl. Phys. 53(3), Mar. 1982, Fabrication of a Thin Film Head Using Polyimide Resin and Sputtered Ni-Fe Films, Hanazono et al., pp. 2608-2610.
Hanazono Masanobu
Hara Shin-ichi
Kobayashi Tetsuo
Mitsuoka Katsuya
Morijiri Makoto
Computer Basic Technology Research Association
Powell William A.
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