Method of pattern formation utilizing radiation-sensitive resin

Details Method of pattern formation utilizing radiation-sensitive resin Method of pattern formation utilizing radiation-sensitive resin

1994-12-16

1996-02-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430327, 430330, G03F 738

Patent

active

054947847

ABSTRACT:
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

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