Method of pattern delineation

Details Method of pattern delineation Method of pattern delineation

2008-02-13

2010-10-26

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S030000, C430S942000, C250S492220, C250S492300

Reexamination Certificate

active

07820362

ABSTRACT:
A method of delineating a lithographic pattern on a material. A pattern to be delineated is divided according to first and second fields by first and second methods of division. Pattern segments contained in the first fields are divided in the X-direction, and data about the resulting pattern subsegments is obtained. Pattern segments contained in the second fields are divided in the Y-direction, and data about the resulting pattern subsegments is obtained. The two methods are so carried out that a pattern segment located across a field boundary during implementation of one of the two methods of division is located around the center of a field during implementation of the other method. In each field, the pattern segments obtained by the X division and Y division, respectively, are overlapped and written with a half of the dose normally used.

REFERENCES:
patent: 6060716 (2000-05-01), Kawase

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