Method of passivating of low dielectric materials in wafer...

Details Method of passivating of low dielectric materials in wafer... Method of passivating of low dielectric materials in wafer...

2007-09-18

2007-09-18

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S329000, C134S001300

Reexamination Certificate

active

10379984

ABSTRACT:
A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising organo-groups with five carbon atoms such as hexamethyldisilazane (HMDS) and chlorotrimethylsilane (TMCS) and combinations thereof. The silicon oxide-based low-k material, in accordance with embodiments of the invention, is maintained at temperatures in a range of 40 to 200 degrees Celsius, and preferably at a temperature of about 150 degrees Celsius, and at pressures in a range of 1,070 to 9,000 psi, and preferably at a pressure of about 3,000 psi, while being exposed to the supercritical passivating solution. In accordance with further embodiments of the invention, a silicon oxide-based low-k material is simultaneously cleaned and passivated using a supercritical carbon dioxide cleaning solution.

REFERENCES:
patent: 2439689 (1948-04-01), Hyde et al.
patent: 2617719 (1952-11-01), Stewart
patent: 2993449 (1961-07-01), Harland
patent: 3135211 (1964-06-01), Pezzillo
patent: 3642020 (1972-02-01), Payne
patent: 3646948 (1972-03-01), Athey
patent: 3890176 (1975-06-01), Bolon
patent: 3900551 (1975-08-01), Bardoncelli et al.
patent: 4219333 (1980-08-01), Harris
patent: 4341592 (1982-07-01), Shortes et al.
patent: 4349415 (1982-09-01), DeFilippi et al.
patent: 4475993 (1984-10-01), Blander et al.
patent: 4730630 (1988-03-01), Ranft
patent: 4749440 (1988-06-01), Blackwood et al.
patent: 4838476 (1989-06-01), Rahn
patent: 4877530 (1989-10-01), Moses
patent: 4879004 (1989-11-01), Oesch et al.
patent: 4923828 (1990-05-01), Gluck et al.
patent: 4925790 (1990-05-01), Blanch et al.
patent: 4933404 (1990-06-01), Beckman et al.
patent: 4944837 (1990-07-01), Nishikawa et al.
patent: 5011542 (1991-04-01), Weil
patent: 5013366 (1991-05-01), Jackson et al.
patent: 5068040 (1991-11-01), Jackson
patent: 5071485 (1991-12-01), Matthews et al.
patent: 5091207 (1992-02-01), Tanaka
patent: 5105556 (1992-04-01), Kurokawa et al.
patent: 5158704 (1992-10-01), Fulton et al.
patent: 5174917 (1992-12-01), Monzyk
patent: 5185058 (1993-02-01), Cathey, Jr.
patent: 5185296 (1993-02-01), Morita et al.
patent: 5196134 (1993-03-01), Jackson
patent: 5201960 (1993-04-01), Starov
patent: 5213619 (1993-05-01), Jackson et al.
patent: 5215592 (1993-06-01), Jackson
patent: 5225173 (1993-07-01), Wai
patent: 5236602 (1993-08-01), Jackson
patent: 5237824 (1993-08-01), Pawliszyn
patent: 5238671 (1993-08-01), Matson et al.
patent: 5250078 (1993-10-01), Saus et al.
patent: 5261965 (1993-11-01), Moslehi
patent: 5266205 (1993-11-01), Fulton et al.
patent: 5269815 (1993-12-01), Schlenker et al.
patent: 5269850 (1993-12-01), Jackson
patent: 5274129 (1993-12-01), Natale
patent: 5285352 (1994-02-01), Pastore et al.
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 5290361 (1994-03-01), Hayashida et al.
patent: 5294261 (1994-03-01), McDermott et al.
patent: 5298032 (1994-03-01), Schlenker et al.
patent: 5304515 (1994-04-01), Morita et al.
patent: 5306350 (1994-04-01), Hoy et al.
patent: 5312882 (1994-05-01), DeSimone et al.
patent: 5314574 (1994-05-01), Takahashi
patent: 5316591 (1994-05-01), Chao et al.
patent: 5320742 (1994-06-01), Fletcher et al.
patent: 5328722 (1994-07-01), Ghanayem et al.
patent: 5334332 (1994-08-01), Lee
patent: 5334493 (1994-08-01), Fujita et al.
patent: 5352327 (1994-10-01), Witowski
patent: 5356538 (1994-10-01), Wai et al.
patent: 5364497 (1994-11-01), Chau et al.
patent: 5370740 (1994-12-01), Chao et al.
patent: 5370741 (1994-12-01), Bergman
patent: 5370742 (1994-12-01), Mitchell et al.
patent: 5397220 (1995-03-01), Akihisa et al.
patent: 5401322 (1995-03-01), Marshall
patent: 5403621 (1995-04-01), Jackson et al.
patent: 5403665 (1995-04-01), Alley et al.
patent: 5417768 (1995-05-01), Smith, Jr. et al.
patent: 5456759 (1995-10-01), Stanford, Jr. et al.
patent: 5470393 (1995-11-01), Fukazawa
patent: 5474812 (1995-12-01), Truckenmuller et al.
patent: 5482564 (1996-01-01), Douglas et al.
patent: 5486212 (1996-01-01), Mitchell et al.
patent: 5494526 (1996-02-01), Paranjpe
patent: 5500081 (1996-03-01), Bergman
patent: 5501761 (1996-03-01), Evans et al.
patent: 5514220 (1996-05-01), Wetmore et al.
patent: 5522938 (1996-06-01), O'Brien
patent: 5547774 (1996-08-01), Gimzewski et al.
patent: 5550211 (1996-08-01), DeCrosta et al.
patent: 5580846 (1996-12-01), Hayashida et al.
patent: 5589082 (1996-12-01), Lin et al.
patent: 5589105 (1996-12-01), DeSimone et al.
patent: 5629918 (1997-05-01), Ho et al.
patent: 5632847 (1997-05-01), Ohno et al.
patent: 5635463 (1997-06-01), Muraoka
patent: 5637151 (1997-06-01), Schulz
patent: 5641887 (1997-06-01), Beckman et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5665527 (1997-09-01), Allen et al.
patent: 5676705 (1997-10-01), Jureller et al.
patent: 5679169 (1997-10-01), Gonzales et al.
patent: 5679171 (1997-10-01), Saga et al.
patent: 5683473 (1997-11-01), Jureller et al.
patent: 5683977 (1997-11-01), Jureller et al.
patent: 5688879 (1997-11-01), DeSimone
patent: 5700379 (1997-12-01), Biebl
patent: 5714299 (1998-02-01), Combes et al.
patent: 5725987 (1998-03-01), Combes et al.
patent: 5726211 (1998-03-01), Hedrick et al.
patent: 5730874 (1998-03-01), Wai et al.
patent: 5736425 (1998-04-01), Smith et al.
patent: 5739223 (1998-04-01), DeSimone
patent: 5766367 (1998-06-01), Smith et al.
patent: 5783082 (1998-07-01), DeSimone et al.
patent: 5797719 (1998-08-01), James et al.
patent: 5798438 (1998-08-01), Sawan et al.
patent: 5804607 (1998-09-01), Hedrick et al.
patent: 5807607 (1998-09-01), Smith et al.
patent: 5847443 (1998-12-01), Cho et al.
patent: 5866005 (1999-02-01), DeSimone et al.
patent: 5868856 (1999-02-01), Douglas et al.
patent: 5868862 (1999-02-01), Douglas et al.
patent: 5872061 (1999-02-01), Lee et al.
patent: 5872257 (1999-02-01), Beckman et al.
patent: 5873948 (1999-02-01), Kim
patent: 5881577 (1999-03-01), Sauer et al.
patent: 5888050 (1999-03-01), Fitzgerald et al.
patent: 5893756 (1999-04-01), Berman et al.
patent: 5896870 (1999-04-01), Huynh et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 5904737 (1999-05-01), Preston et al.
patent: 5908510 (1999-06-01), McCullough et al.
patent: 5928389 (1999-07-01), Jevtic
patent: 5932100 (1999-08-01), Yager et al.
patent: 5944996 (1999-08-01), DeSimone et al.
patent: 5954101 (1999-09-01), Drube et al.
patent: 5955140 (1999-09-01), Smith et al.
patent: 5965025 (1999-10-01), Wai et al.
patent: 5976264 (1999-11-01), McCullough et al.
patent: 5980648 (1999-11-01), Adler
patent: 5992680 (1999-11-01), Smith
patent: 5994696 (1999-11-01), Tai et al.
patent: 6005226 (1999-12-01), Aschner et al.
patent: 6017820 (2000-01-01), Ting et al.
patent: 6021791 (2000-02-01), Dryer et al.
patent: 6024801 (2000-02-01), Wallace et al.
patent: 6037277 (2000-03-01), Masakara et al.
patent: 6063714 (2000-05-01), Smith et al.
patent: 6067728 (2000-05-01), Farmer et al.
patent: 6085762 (2000-07-01), Barton
patent: 6099619 (2000-08-01), Lansbarkis et al.
patent: 6100198 (2000-08-01), Grieger et al.
patent: 6110232 (2000-08-01), Chen et al.
patent: 6114044 (2000-09-01), Houston et al.
patent: 6128830 (2000-10-01), Bettcher et al.
patent: 6140252 (2000-10-01), Cho et al.
patent: 6149828 (2000-11-01), Vaartstra
patent: 6171645 (2001-01-01), Smith et al.
patent: 6200943 (2001-03-01), Romack et al.
patent: 6216364 (2001-04-01), Tanaka et al.
patent: 6224774 (2001-05-01), DeSimone et al.
patent: 6228563 (2001-05-01), Starov et al.
patent: 6228826 (2001-05-01), DeYoung et al.
patent: 6232238 (2001-05-01), Chang et al.
patent: 6232417 (2001-05-01), Rhodes et al.
patent: 6235145 (2001-05-01), Li et al.
patent: 6239038 (2001-05-01), Wen
patent: 6242165 (2001-06-01), Vaartstra
patent: 6251250 (2001-06-01), Keigler
patent: 6255732 (2001-07-01), Yokoyama et al.
patent: 6262510 (2001-07-01), Lungu
patent: 6270531 (2001-08-01), DeYoung et al.
patent: 6270948 (2001-08-01), Sato et al.
patent: 6277753 (2001-08-01), Mullee et al.
patent: 6284558 (2001-09-01), Sakamoto
patent: 6286231 (2001-09-01), Bergman et al.
patent: 6

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