Method of modifying insulating film

Details Method of modifying insulating film Method of modifying insulating film

2005-11-30

2010-02-02

Luu, Chuong A. (Department: 2892)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S795000, C438S770000, C438S776000

Reexamination Certificate

active

07655574

ABSTRACT:
An insulting film is modified by subjecting the insulting film to a modification treatment comprising a combination of a plasma treatment and a thermal annealing treatment. There is provided a method of enhancing the characteristic of an insulating film by improving deterioration in the characteristic of the insulating film due to carbon, a suboxide, a dangling bond or the like contained in the insulating film.

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