Method of measuring thin layers using SIMS

Radiant energy – Inspection of solids or liquids by charged particles – Positive ion probe or microscope type

Reexamination Certificate

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C250S492210, C250S492300, C257SE27001, C257SE23041, C257SE23134, C257SE23173, C257SE21021, C438S014000, C438S624000, C438S763000

Reexamination Certificate

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07579590

ABSTRACT:
A method for measuring the thickness of a layer is provided, comprising (a) providing a structure (101) comprising a first layer disposed on a second layer; (b) impinging (103) the structure with a first ion beam comprising a first isotope, thereby sputtering off a portion of the first layer which contains a second isotope and exposing a portion of the second layer; and (c) determining (105) the thickness of the first layer by measuring the amount of the second isotope which is sputtered off.

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Cole, D.A. et al.; “SiO2 thickness determination by x-ray photoelectron spectroscopy, secondary ion mass spectrometry, Rutherform backscattering, transmission electron microscopy, and ellipsometry”; J. Vac. Sci. Technol. B 18(1); Jan./Feb. 2000; pp. 440-444.
Chang, H.S. et al.; “Measurement of the physical and electrical thickness of ultrathin gate oxides”; J. Vac Sci. Technol. B 20(5), Sep./Oct. 2002; pp. 1836-1842.

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