Method of manufacturing vertical MOSFET

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

438543, 438546, 438904, H01L 21336

Patent

active

057473714

ABSTRACT:
A semiconductor device includes a substrate (11), a first region (21) in the substrate (11) wherein the first region (21) has a first conductivity type, a second region (22) in the substrate (11) wherein the second region (22) is adjacent to the first region (21) and wherein the second region (22) has a second conductivity type different from the first conductivity type, and a third region (24) in the substrate (11) wherein the third region (24) overlaps the first and second regions (21, 22) and wherein the third region (24) has a damaged crystalline structure.

REFERENCES:
patent: 4053925 (1977-10-01), Burr et al.
patent: 4203780 (1980-05-01), Matsushita et al.
patent: 4717588 (1988-01-01), Wilson et al.
patent: 4987098 (1991-01-01), Nishiura et al.
patent: 5227315 (1993-07-01), Frisina et al.
patent: 5441900 (1995-08-01), Bulucea et al.
S. Coffa et al., J. Appl. Phys., American Institute of Physics, vol. 69, No. 3, Feb. 1991, pp. 1350-1354.
Marisa Francesca Catania et al., IEEE Transactions on Electron Devices, "Optimization of the Tradeoff Between Switching Speed of the Internal Diode and On-Resistance in Gold-and Platinum-Implanted Power Metal-Oxide-Semiconductor Devices", vol. 39, No. 12, Dec. 1992, pp. 2745-2748.
Monique Bagneres Moisseron, Laboratoire d'Analyse et d'Architecture des Systemes, "These--Etude de procedes technologiques pour le controle des proprietes de commutation des composants bipolaires de puissance", Jun. 29, 1995, Chapter 2, pp. 32-61.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing vertical MOSFET does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing vertical MOSFET, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing vertical MOSFET will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-53845

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.